Abstract: Tungsten oxide (WO₃) thin films were deposited using a Direct Current Magnetron sputtering system on glass substrates thoroughly cleaned and mounted on a rotating holder to ensure uniform film deposition. Precursor solutions with WO₃ concentrations of 0.1M, 0.2M, and 0.3M were prepared from sodium tungstate (Na₂WO₄). Deposition was conducted at a base pressure of ~1.0 x 10⁻⁶ Torr, working pressure of 3.0 x 10⁻³ Torr, argon flow rate of 20 sccm, and power of 200 W, followed by a pre-sputtering process and subsequent film deposition at room temperature for 1 hour. Some of the films were annealed at 200 °C for 60 minutes. Optical properties of both the as-....
Key Word: Sputtering, Conductive Oxides, electrochromic, Direct Current, sodium tungstate
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